Atomic Force Microscopy Measurements of Topography and Friction on Dotriacontane Films Adsorbed on a Sio2 Surface

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dc.contributor.authorTrogisch, S.
dc.contributor.authorVogt, Nikolaus
dc.date.accessioned2017-04-12T14:18:40Z
dc.date.available2017-04-12T14:18:40Z
dc.date.issued2005
dc.identifier.issn0021-9606
dc.identifier.urihttps://repositorio.uc.cl/handle/11534/19776
dc.language.isoen
dc.nota.accesoContenido parcial
dc.relation.isformatofJournal of Chemical Physics. Vol. 123, no. 15 (2005), p. [154703]-154703
dc.revistaJournal of Chemical Physicses_ES
dc.rightsacceso restringido
dc.subject.ddc510
dc.subject.deweyMatemática física y químicaes_ES
dc.subject.otherMicroscopía de fuerza atómicaes_ES
dc.subject.otherPelículas delgadases_ES
dc.subject.otherFísicaes_ES
dc.titleAtomic Force Microscopy Measurements of Topography and Friction on Dotriacontane Films Adsorbed on a Sio2 Surfacees_ES
dc.typeartículo
sipa.codpersvinculados100470
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