A Compact Ultrafast Capillary Discharge for Euv Projection Lithography

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dc.contributor.authorKrisch I
dc.contributor.authorFavre Domínguez, Mario
dc.date.accessioned2017-04-10T18:36:09Z
dc.date.available2017-04-10T18:36:09Z
dc.date.issued2000
dc.identifier.doi10.1002/(SICI)1521-3986(200004)40:1/2<135
dc.identifier.issn0863-1042
dc.identifier.urihttps://doi.org/10.1002/(SICI)1521-3986(200004)40:1/2<135
dc.identifier.urihttps://repositorio.uc.cl/handle/11534/17302
dc.language.isoen
dc.relation.isformatofContributions to Plasma Physics. Vol. 40, no. 2 (2000), p. [135]-140
dc.revistaContributions to Plasma Physicses_ES
dc.subject.ddc700
dc.subject.deweyArtees_ES
dc.subject.otherLitografía de rayos xes_ES
dc.subject.otherLitografía - Técnicaes_ES
dc.subject.otherImpresion litograficaes_ES
dc.titleA Compact Ultrafast Capillary Discharge for Euv Projection Lithographyes_ES
dc.typeartículo
sipa.codpersvinculados99732
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