An electrochemical deposition route for obtaining alpha-Fe2O3 thin films - II. EQCM study and semiconductor properties

Simple item page
dc.contributor.authorSchrebler, Ricardo
dc.contributor.authorLlewelyn, Cynthia
dc.contributor.authorVera, Francisca
dc.contributor.authorCury, Paula
dc.contributor.authorMunoz, Eduardo
dc.contributor.authordel Rio, Rodrigo
dc.contributor.authorMeier, Humberto Gomez
dc.contributor.authorCordova, Ricardo
dc.contributor.authorDalchiele, Enrique A.
dc.date.accessioned2024-01-10T12:37:33Z
dc.date.available2024-01-10T12:37:33Z
dc.date.issued2007
dc.description.abstractThe electrochemical formation of hematite (alpha-Fe2O3) precursor thin films (oxyhydroxide iron compounds), onto gold substrates in an aqueous solution of Fe (III) + KF + H2O2 was investigated in situ using an electrochemical quartz crystal microbalance (EQCM) and voltammetric techniques. Nanostructured alpha-Fe2O3 obtained after annealing of oxyhydroxide iron compounds thin films have been prepared onto SnO2/F covered glass substrates through a potential cycling procedure in this electrolytic bath. Photoelectrochemical measurements, carried out in 0.1 M NaOH + 0.05 M KI electrolyte at pH 13, show an n-type behavior, a flatband potential of -1.08 V vs saturated mercury/mercury sulfate reference electrode, and an apparent donor density of 1.26 X 10(19) cm(-3) at 1 kHz. (C) 2007 The Electrochemical Society.
dc.fechaingreso.objetodigital2024-05-14
dc.format.extent5 páginas
dc.fuente.origenWOS
dc.identifier.doi10.1149/1.2756160
dc.identifier.issn1099-0062
dc.identifier.urihttps://doi.org/10.1149/1.2756160
dc.identifier.urihttps://repositorio.uc.cl/handle/11534/76874
dc.identifier.wosidWOS:000248659800011
dc.information.autorucQuímica;Del Río R;S/I;1005788
dc.issue.numero10
dc.language.isoen
dc.nota.accesocontenido parcial
dc.publisherELECTROCHEMICAL SOC INC
dc.revistaELECTROCHEMICAL AND SOLID STATE LETTERS
dc.rightsacceso restringido
dc.subjectPHOTOELECTROCHEMICAL PROPERTIES
dc.subjectPHOTO-OXIDATION
dc.subjectOXIDE-FILMS
dc.subjectWATER
dc.subjectELECTRODES
dc.subjectHEMATITE
dc.subjectCELLS
dc.subject.ods06 Clean Water and Sanitation
dc.subject.odspa06 Agua limpia y saneamiento
dc.titleAn electrochemical deposition route for obtaining alpha-Fe2O3 thin films - II. EQCM study and semiconductor properties
dc.typeartículo
dc.volumen10
sipa.codpersvinculados1005788
sipa.indexWOS
sipa.trazabilidadCarga SIPA;09-01-2024
Files
Original bundle
Now showing 1 - 1 of 1
Thumbnail Image
Name:
An electrochemical deposition route for obtaining alpha-Fe2O3 thin films - II. EQCM study and semiconductor properties.pdf
Size:
2.72 KB
Format:
Adobe Portable Document Format
Description:
Download
Collections
Artículos de revistas