Breakdown Formation in a Transient Hollow Cathode Discharge-A Statistical Study
dc.contributor.author | Choi, P. | |
dc.contributor.author | Chuaqui, Hernán | |
dc.contributor.author | Favre Domínguez, Mario | |
dc.date.accessioned | 2017-04-25T19:24:21Z | |
dc.date.available | 2017-04-25T19:24:21Z | |
dc.date.issued | 1995 | |
dc.identifier.doi | 10.1109/27.402304 | |
dc.identifier.issn | 0093-3813 | |
dc.identifier.uri | https://doi.org/10.1109/27.402304 | |
dc.identifier.uri | https://repositorio.uc.cl/handle/11534/20278 | |
dc.language.iso | en | |
dc.relation.isformatof | Ieee Transactions on Plasma Science Vol. 23, no. 3 (1995), p. [221]-228 | |
dc.revista | Ieee Transactions on Plasma Science | es_ES |
dc.rights | acceso restringido | |
dc.subject.ddc | 620 | |
dc.subject.dewey | Ingeniería | es_ES |
dc.subject.other | Absorcion atómicaIonización | es_ES |
dc.subject.other | Física | es_ES |
dc.title | Breakdown Formation in a Transient Hollow Cathode Discharge-A Statistical Study | es_ES |
dc.type | artículo | |
sipa.codpersvinculados | 98761 | |
sipa.codpersvinculados | 99732 |
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