Archival and Wide Exposure Latitude Process for Holography
dc.contributor.author | Aliaga R | |
dc.contributor.author | Chuaqui, Hernán | |
dc.date.accessioned | 2017-04-10T18:36:05Z | |
dc.date.available | 2017-04-10T18:36:05Z | |
dc.date.issued | 1990 | |
dc.identifier.issn | 1559-128X | |
dc.identifier.uri | https://repositorio.uc.cl/handle/11534/17277 | |
dc.language.iso | en | |
dc.nota.acceso | Contenido parcial | |
dc.relation.isformatof | Applied Optics. Vol. 29, no. 19 (1990), p. [2861]-2863 | |
dc.revista | Applied Optics | es_ES |
dc.rights | acceso restringido | |
dc.subject.ddc | 620 | |
dc.subject.dewey | Ingeniería | es_ES |
dc.subject.other | Holografía | es_ES |
dc.subject.other | Emulsiones fotográficas | es_ES |
dc.subject.other | Difracción | es_ES |
dc.title | Archival and Wide Exposure Latitude Process for Holography | es_ES |
dc.type | artículo | |
sipa.codpersvinculados | 98761 |
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