Tailoring of titanium dioxide thin film in dual radiofrequency plasma enhanced pulsed laser deposition

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dc.catalogadordfo
dc.contributor.authorVillegas Dissett, Rodrigo Benjamín
dc.contributor.authorTomlinson Cornejo, Matías Paul
dc.contributor.authorUreta De La Fuente, Valentina Isidora
dc.contributor.authorCarrasco Navarro, Camilo Antonio
dc.contributor.authorMiranda, Maximiliano
dc.contributor.authorFernández Adell, José Ignacio
dc.contributor.authorSaavedra, Daniel
dc.contributor.authorRetamal, María José
dc.contributor.authorInestrosa-Izurieta, Maria Jose
dc.contributor.authorSingh, Dinesh Pratap
dc.contributor.authorAngel Figueroa, Felipe Alfonso
dc.contributor.authorVolkmann, Ulrich Georg
dc.contributor.authorTakamura, Yayoi
dc.contributor.authorBhuyan, Heman
dc.date.accessioned2025-06-27T14:06:53Z
dc.date.available2025-06-27T14:06:53Z
dc.date.issued2025
dc.description.abstractEfficient and cost-effective methods to create photovoltaic materials are constantly being sought, with metal oxides like TiO2 playing a key role in this field. In this study, TiO2 thin films were grown on glass substrates using a dual radiofrequency (RF) plasma-enhanced pulsed laser deposition (PLD) system with a thermal budget that remained below 400 °C. The physical, chemical, and optical properties of the deposited thin films were studied as a function of low- and high-RF powers as well as deposition time. These parameters were found to impact the proportion of anatase and rutile phase and their crystallinity, as well as the oxygen vacancy concentration and band gap energy. These findings demonstrated the utility of dual RF plasma-enhanced PLD for precise modulation of TiO2 thin-films, offering promising applications in photovoltaics and photocatalysis
dc.fuente.origenORCID
dc.identifier.doi10.1016/j.apsusc.2025.163872
dc.identifier.issn0169-4332
dc.identifier.urihttps://doi.org/10.1016/j.apsusc.2025.163872
dc.identifier.urihttps://repositorio.uc.cl/handle/11534/104778
dc.information.autorucInstituto de Física; Villegas Dissett Rodrigo Benjamin; S/I; 1064537
dc.information.autorucEscuela de Ingeniería; Tomlinson Cornejo Matias Paul; S/I; 245555
dc.information.autorucInstituto de Física; Ureta De La Fuente Valentina Isidora; S/I; 1086703
dc.information.autorucInstituto de Astrofísica; Carrasco Navarro Camilo Antonio; S/I; 1133014
dc.information.autorucInstituto de Física; Fernandez Adell Jose Ignacio; S/I; 221915
dc.information.autorucEscuela de Química; Angel Figueroa Felipe Alfonso; 0000-0002-5099-3034; 142007
dc.information.autorucInstituto de Física; Volkmann Ulrich Georg; 0000-0003-4972-5558; 100470
dc.information.autorucInstituto de Física; Bhuyan Heman; 0000-0002-6432-6654; 1003913
dc.language.isoen
dc.nota.accesocontenido parcial
dc.rightsacceso restringido
dc.subjectRadio frequency plasma
dc.subjectPulsed laser deposition
dc.subjectTitanium dioxide
dc.subjectAnatase
dc.subjectRutile
dc.subject.ddc510
dc.subject.deweyMatemática física y químicaes_ES
dc.subject.ods07 Affordable and clean energy
dc.subject.odspa07 Energía asequible y no contaminante
dc.titleTailoring of titanium dioxide thin film in dual radiofrequency plasma enhanced pulsed laser deposition
dc.typeartículo
sipa.codpersvinculados1064537
sipa.codpersvinculados245555
sipa.codpersvinculados1086703
sipa.codpersvinculados1133014
sipa.codpersvinculados221915
sipa.codpersvinculados142007
sipa.codpersvinculados100470
sipa.codpersvinculados1003913
sipa.trazabilidadORCID;2025-06-23
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