Studies on scalability and scaling laws for the plasma focus: similarities and differences in devices from 1MJ to 0.1J

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dc.contributor.authorSoto, L.
dc.contributor.authorVeloso Espinosa, Felipe Eduardo
dc.date.accessioned2016-05-10T18:16:31Z
dc.date.available2016-05-10T18:16:31Z
dc.date.issued2010
dc.identifier.issn0963-0252
dc.identifier.urihttps://repositorio.uc.cl/handle/11534/14059
dc.language.isoen
dc.nota.accesoContenido parcial
dc.relation.isformatofPlasma Sources Science & Technology No. 5 (19), p. 1-9.
dc.revistaPlasma Sources Science & Technologyes_ES
dc.rightsacceso restringido
dc.subject.ddc510
dc.subject.deweyMatemática física y químicaes_ES
dc.subject.otherNeutroneses_ES
dc.subject.otherPlasma (Ionized gases)es_ES
dc.subject.otherFísicaes_ES
dc.titleStudies on scalability and scaling laws for the plasma focus: similarities and differences in devices from 1MJ to 0.1Jes_ES
dc.typeartículo
sipa.codpersvinculados14943
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