A Novel Growth Mode of Alkane Films on a Sio2 Surface

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dc.contributor.authorMo, H.
dc.contributor.authorVogt, Nikolaus
dc.date.accessioned2017-04-11T20:51:42Z
dc.date.available2017-04-11T20:51:42Z
dc.date.issued2003
dc.identifier.doi10.1016/S0009-2614(03)01106-0
dc.identifier.issn0009-2614
dc.identifier.urihttps://doi.org/10.1016/S0009-2614(03)01106-0
dc.identifier.urihttps://repositorio.uc.cl/handle/11534/19141
dc.language.isoen
dc.relation.isformatofChemical Physics Letters. Vol. 377, no. 2 (2003), p. [99]-105
dc.revistaChemical Physics Letterses_ES
dc.rightsacceso restringido
dc.subject.ddc510
dc.subject.deweyMatemática física y químicaes_ES
dc.subject.otherAlcanoses_ES
dc.subject.otherOxido de silicioes_ES
dc.subject.otherElipsometríaes_ES
dc.subject.otherDispersión de rayos xes_ES
dc.titleA Novel Growth Mode of Alkane Films on a Sio2 Surfacees_ES
dc.typeartículo
sipa.codpersvinculados100470
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