CdS amorphous thin films photochemical synthesis and optical characterization
link https://doi.org/10.1016/j.mssp.2009.04.004account_box Tejos, Marisolaccount_box Rolon, Barbara G.account_box del Rio, Rodrigoaccount_box Cabello, Gerardo
Comparte este registro
Thin amorphous nanostructured CdS films were photochemically obtained via direct UV radiation (lambda = 254 nm) of complex Cd[(CH3)(2)CHCH2CH2OCS2](2) on Si(100) and ITO-covered glass substrate by spin coating. Thin cadmium xanthate complex films' UV photolysis results in loss of all ligands from the coordination sphere. X-ray photoelectron spectra for as-deposited US thin films show the most representative signals of Cd 3d(5/2) located at 405eV, Cd 3d(3/2) located at 412eV and a small signal S 2p located at 162 eV. The surface morphology of the films was examined via atomic force microscopy. This can be described as a fibrous-type surface without structural order, which is characteristic of an amorphous deposit. The optical band gap value was 2.85 and 3.15 +/- 0.1 eV. (C) 2009 Elsevier Ltd. All rights reserved.
Registro Sencillo
Registro Completo
| Autor | Tejos, Marisol Rolon, Barbara G. del Rio, Rodrigo Cabello, Gerardo |
| Título | CdS amorphous thin films photochemical synthesis and optical characterization |
| Revista | Materials science in semiconductor processing |
| ISSN | 1369-8001 |
| ISSN electrónico | 1873-4081 |
| Volumen | 11 |
| Número de publicación | 3 |
| Página inicio | 94 |
| Página final | 99 |
| Fecha de publicación | 2008 |
| Resumen | Thin amorphous nanostructured CdS films were photochemically obtained via direct UV radiation (lambda = 254 nm) of complex Cd[(CH3)(2)CHCH2CH2OCS2](2) on Si(100) and ITO-covered glass substrate by spin coating. Thin cadmium xanthate complex films' UV photolysis results in loss of all ligands from the coordination sphere. X-ray photoelectron spectra for as-deposited US thin films show the most representative signals of Cd 3d(5/2) located at 405eV, Cd 3d(3/2) located at 412eV and a small signal S 2p located at 162 eV. The surface morphology of the films was examined via atomic force microscopy. This can be described as a fibrous-type surface without structural order, which is characteristic of an amorphous deposit. The optical band gap value was 2.85 and 3.15 +/- 0.1 eV. (C) 2009 Elsevier Ltd. All rights reserved. |
| Derechos | acceso restringido |
| Agencia financiadora | Universidad de Valparaiso |
| DOI | 10.1016/j.mssp.2009.04.004 |
| Enlace | |
| Id de publicación en WoS | WOS:000268123200004 |
| Palabra clave | Amorphous materials Photochemical synthesis Thin film Optical materials |
| Tema ODS | 07 Affordable and Clean Energy |
| Tema ODS español | 07 Energía asequible y no contaminante |
| Tipo de documento | artículo |